西川 宏之
電気工学科 (工学部)
教授
■専門分野
電気工学、光・電気・電子材料工学、量子ビーム応用
■研究の内容
■研究室分野キーワード
イオン、電子、光などの量子ビームを細く、細く絞って、モノづくりに応用するための研究をしています。量子ビームはマイクロ、ナノメートルといった微細なモノづくりを実現するために不可欠で、これを物質の表面に照射した時に起こる現象を利用すれば、ミクロなモノづくりが実現できます。教員と学生が一丸となって、ミクロの世界で活躍する光、電子回路、機械をつくるために、毎日研究に取り組んでいます。
電気・電子
■教員研究テーマ
①量子ビーム応用工学②プロトンビームライティングによる微細加工、改質と応用③誘電泳動による微粒子、菌体の捕集、操作
■研究室テーマ
①プロトンビームライティングによる②ガラス・ポリマー・半導体のマイクロマシニングとMEMS応用③誘電泳動による微生物捕集デバイスの作製
■研究パネル
■主な著書
  • 電気電子材料工学(2013/09 数理工学社刊行 西川宏之 著)
  • EEText 電磁気学(4章、13章)(2007/12 オーム社刊行)
  • 誘電体物性(2002/09 培風館刊行)
  • Structures and properties of amorphous silicon dioxide -issues on the reliability and novel applications(2001/03 Academic Press刊行「Silicon-Based Materials and Devices” edited by H. S. Nalwa」2巻 p.99~123)
  • シリコン熱酸化膜とその界面-基礎物性から超LSIへの応用まで-(1991/07 ㈱リアライズ社刊行)
■主な論文
  • Development of embedded Mach忙ehnder optical waveguide structures in polydimethylsiloxane thin films by proton beam writing(2015/04 Nucl. Instr. Meth. Phys. Res.)
  • Fabrication of polydimethylsiloxane microlens arrays on a plastic film by proton beam writing(2014/10 J. Vac. Sci. Technol.)
  • Fabrication of curved PDMS microstructures on silica glass by proton beam writing aimed for micro-lens arrays on transparent substrates(2013/07 Nuclear Instruments and Methods in Physics Research B)
  • Enhancing proton beam writing system with auto scanning software and stage movement(2013/02 Microelectronic Engineering)
  • Control of Refractive Index of Fluorinated Polyimide by Proton Beam Irradiation(2012/12 Jpn. J. Appl. Phys.)
  • Visualization of focused proton beam dose distribution by atomic force microscopy using blended polymer films based on polyacrylic acid(2012/09 Journal of Nanoscience and Nanotechnology)
  • Fabrication of Poly(9,90-dioctylfluorene)-Based Nano- and Microstructures by Proton Beam Writing(2012/04 Jpn. J. Appl. Phys.)
  • Fabrication of Concave and Convex Structure Array Consisted of Epoxy Long-Nanowires by Light and Heavy Ion Beams Lithography(2012/02 Transactions of Materials Research Society of Japan)
  • Fabrication of Polymer Optical Waveguides for the 1.5-μm Band Using Focused Proton Beam(2012/01 Key Engineering Materials)
  • Microprocessing of Arched Bridge Structures with Epoxy Resin by Proton Beam Writing(2012/01 Journal of Photopolymer Science and Technology)
  • Microbeam complex at TIARA: Technologies to meet a wide range of applications(2011/10 Nuclear Instruments and Methods in Physics Research B)
  • Fabrication of silica-based three-dimensional structures by changing fluence using proton beam writing(2011/09 Transactions of the Materials Research Society of Japan)
  • Nano-micro Processing of Epoxy Resin Systems by Ion Beam Lithography with Multiple Energies and Species(2011/09 Transactions of the Materials Research Society of Japan)
  • Electroforming of Ni mold for imprint lithography using high-aspect-ratio PMMA microstructures fabricated by proton beam writing(2011/08 Microelectronic Engineering)
  • Soft-lithographic methods for the fabrication of dielectrophoretic devices using molds by proton beam writing(2010/05 Microelectronic Engineering)
  • マイクロビームによる高アスペクト比微細加工(2009/06 放射線と産業)
  • Micro-patterning of Siloxane Films by Proton Beam Writing(2009/06 Journal of Photopolymer Science and Technology, Vol.22, pp.239-243(2009))
  • Fabrication and evaluation of 3D-electric micro filters using proton beam writing(2009/04 Microelectronic Engineering)
  • Electroplating using high-aspect-ratio microstructures fabricated by proton beam writing(2009/04 Microelectronic Engineering)
  • Development of micromachining technology in ion microbeam system at TIARA, JAEA(2009/03 Applied Radiation and Isotopes)
  • Fabrication of nanowires by varying energy microbeam lithography using heavy ions at the TIARA(2009/01 Nuclear Instruments and Methods in Physics Research B)
  • Applications of microstructures fabricated by proton beam writing to electric-micro filters(2009/01 Nuclear Instruments and Methods in Physics Research B)
  • Ni electroplating on a resist micro-machined by proton beam writing(2008/10 Microsystem Technologies)
  • Fabrication of three-dimensional structures of resist by proton beam writing(2007/11 Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures)
  • Modification of structural and optical properties of silica glass induced by ion microbeam(2007/08 Surface and Coatings Technology)
  • Micro-machining of resists on silicon by proton beam writing(2007/07 Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms)
  • Micro-photoluminescence study on defects induced by ion microbeam in silica glass(2007/04 Journal of Non-Crystalline Solids)
  • Correlation between the luminescence properties and the surface structures of submicron silica particles(2007/04 Journal of Non-Crystalline Solids)
  • Spatial distribution of irradiation effects on silica glass induced by 15-MeV oxygen ion microbeam(2006/01 Nuclear Instruments and Methods in Physics Research B)
  • Effects of Ion Microbeam Irradiation on Silica Glass(2004/03 Transactions of the Materials Research Society of Japan)
  • Characterization of ion-implanted silica glass by micro-photoluminescence and Raman spectroscopy(2003/09 Nuclear Instruments and Methods in Physics Research B)
  • Characterization of refractive index changes of silica glass induced by ion microbeam(2003/09 Nuclear Instruments and Methods in Physics Research B)
  • Characterization of ion-implanted silica glass by vacuum ultraviolet absorption spectroscopy(2002/05 Nuclear Instruments and Methods in Physics Research B)
  • Radiation effects and surface deformation of silica by ion microbeam(2002/05 Nuclear Instruments and Methods in Physics Research B)
  • Evaluation of silica glasses implanted by high-energy ions using a uv-excited microscopy(2002/05 Nuclear Instruments and Methods in Physics Research B)
  • シリカ系フォトニクスガラスの高機能化(2001/08 電気学会論文誌A部門誌)
  • Oxygen-deficient centers and excess Si in buried oxide using photoluminescence spectroscopy(1999/12 Physical Review B)
  • Defects in thermal oxide studied by photoluminescence spectroscopy(1999/08 Applied Physics Letters)
  • Characteristic red photoluminescence band in oxygen-deficient silica glass(1999/07 Journal of Applied Physics)
  • Temperature dependence of the lifetime of 4.3-eV photoluminescence in oxygen-deficient amorphous SiO2(1999/01 Physical Review B)
  • Structure and generation mechanisms of paramagnetic centers and absorption bands responsible for Ge-doped SiO2 optical-fiber gratings(1998/02 Physical Review B)
  • Energy states of Ge-doped SiO2 glass estimated through absorption and photoluminescence(1997/02 Journal of Applied Physics)
  • Photoluminescence of oxygen-deficient-type defects in a-SiO2(1997/01 Journal of Non-Crystalline Solids)
  • Luminescence properties of sol-gel synthesized silica glass induced by an ArF excimer(1997/01 Journal of Physics D: Applied Physics)
  • Thermal annealing behavior of defects induced by ion implantation in thermally grown SiO2 films(1997/01 Microelectrons Engineering)
  • Changes in the optical properties of Ge-doped silica glass during exposure to a KrF excimer laser(1997/01 Journal of Non-Crystalline Solids)
  • Effect of implanted ion species on the decay of 2.7 eV photoluminescence in thermal(1996/12 Journal of Applied Physics)
  • エキシマレーザ,γ線,および機械的応力による非晶質SiO2中の常磁性中心の生成機構(1996/12 電気学会論文誌A)
  • 発光減衰曲線の解析によるSiO2の微視的構造の乱雑さの評価(1996/10 電気学会論文誌A)
  • Visible photoluminescence from Si clusters in γ-irradiated amorphous SiO2(1996/09 Journal of Applied Physics)
  • シリコン酸化膜中の点欠陥の新しい検出法(解説論文)(1996/05 電気学会論文誌A)
  • Laser-power dependence of absorption changes in Ge-doped SiO2 glass induced by a KrF excimer laser(1996/04 Physical Review B,)
  • Photoluminescence study on point defects in buried SiO2 film formed by implantation of oxygen(1996/01 Journal of Applied Physics)
  • Photoluminescence study of defect in ion-implanted thermal SiO2 films(1995/07 )
  • Nature of photoluminescence involving transitions from ground to 4fn-15d1 states in rare-earth-doped glasses(1995/04 Journal of Applied Physics)
  • Photoluminescence Study on Point Defects in SIMOX Buried SiO2 Film(1995/01 Materials Science Forum)
  • Paramagnetic Defect Centers Induced by Excimer Lasers, γ-Rays, and Mechanical Fracturing in Amorphous SiO2(1995/01 Defect and Diffusion Forum)
  • Photoluminescence and electron spin-resonance studies of defects in ion-implanted thermal SiO2 films(1995/01 Materials Science Forum)
  • Role of point defects in dielectric breakdown of SiO2 formed by plasma-enhanced chemical vapor deposition(1995/01 Japanese Journal of Applied Physics)
  • Optical characteristics of SiO2 formed by plasma-enhanced chemical-vapor deposition of tetraethoxysilane(1994/11 Journal of Applied Physics)
  • Gamma-Ray-Induced Loss of Er3+ -Doped Silica-Core Optical Fiber(1994/07 Japanese Journal of Applied Physics)
  • Decay kinetics of the 4.4-eV photoluminescence associated with the two states of oxygen-deficient type defect in amorphous SiO2(1994/03 Physical Review Letters)
  • Point defects in high purity silica induced by high-dose gamma irradiation(1994/02 Journal of Applied Physics)
  • Kinetics of enhanced photogeneration of E' centers in oxygen-deficient silica(1994/01 Journal of Non-Crystalline Solids)
  • Correlation of preexisting diamagnetic defect centers with induced paramagnetic defect centers by ultraviolet or vacuum ultraviolet photons in high-purity silica glasses(1993/12 Physical Review B)
  • Enhaunced photogeneration of E' centers from neutral oxygen vacancies in the presence of hydrogen in high-purity silica glass(1993/08 Physical Review B)
  • Various bonding forms of OH groups in hydrogen-treated silica(1993/08 Journal of Applied Physics)
  • Characterization od ClOx radicals in vacuum-ultraviolet-irradiated high-purity silica(1992/10 The American Physical Society)
  • Photoluminescence from defect centers in high-purity silica glasses observed under 7.9-eV excitation(1992/01 Physical Review B)
  • Si-O-Si strained bond and paramagnetic defect centers induced by mechanical fracturing in amorphous SiO2(1991/11 Journal of Applied Physics)
  • Effect of high-temperature treatment on optical-absorption bands in amorphous SiO2(1991/09 Journal of Applied Physics)
  • Generation mechanism of photoinduced paramagnetic centers from preexisting precursors in high-purity silicas(1990/04 Physical Review B)
  • Defects and optical absorption bands induced by surplus oxygen in high-purity synthetic silica(1988/06 Journal of Applied Physics)